Method of Optimising the Sensitivity of a Surface Plasmon Ellipsometry Apparatus

A method of optimising the sensitivity of surface plasmon ellipsometry(SPE) apparatus used to analyse a surface comprising a conducting film, the method comprising calculating a sensitivity map of SPE for the film, the sensitivity map comprising data defining variations in sensitivity of said SPE apparatus with angle of incidence and polarisation angle of polarised light incident on said film for analysis by said SPE apparatus, and using said sensitivity map to configure said SPE apparatus with a combination of said angle of incidence and polarisation angle located in a region of substantiallymaximum sensitivity in said sensitivity map.

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Patents:
WO 2,009,056,875

Inventor(s): HOOPER IAN RICHARD [GB]; SAMBLES JOHN ROY [GB]; STEWART CIARAN EOIN [GB]

Type of Offer: Sale



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