Spray-On Circuits (MFS-31549)

Abstract:
Researchers at NASA Marshall Space Flight Center developed a new thin-film deposition process that creates a permanent bond between the film and substrate. This patented process, known as vacuum arc vapor deposition (VAVD), can be performed using a traditional vacuum chamber or a hand-held vacuum device. The aerospace industry has been seeking new marking methods that are safe and can withstand harsh environments. To address this need, NASA developed the VAVD process, which uses a vacuum chamber system to produce vapor deposits. VAVD is capable of high deposition rates, yet produces no hazardous wastes or by-products. The VAVD technology can produce thin-film coatings in the form of small, high fidelity part identification symbols that can be read by humans or machines. VAVD can also provide an alternative semiconductor manufacturing process. With VAVD, integrated circuits can be permanently built onto the substrate of virtually any part using layers of thin-film deposition. Because the size and marked, NASA developed a portable hand-held vacuum device that can apply markings. Thin-film deposition can be made in-situ on virtually any metallic and some nonmetallic materials. NASA has tested VAVD with a number of films and substrates. Types of thin films sprayed include chrome, copper, aluminum, stainless steel, titanium, gold, silver, silicon, cobalt, iron, nickel and various ceramics. Types of substrates include various metal surfaces, PVC, ceramics, paper, mineral surfaces such as rocks, and feathers. With VAVD, sensors, circuits and similar devices can be integrated into the surface of a structure without being in the way or becoming detached.

Type of Offer: Licensing



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