Patent Holder
Daniela White
Selected PATENTS - 53 issued patents, US and WO
1. Polyoxometallate compositions and methods. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). US 8,057,561 – B2, 2011
2. Ruthenium CMP composition and methods. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). US 8,008,202 – B2, 2011
3. Copper-passivating CMP composition and methods. White, Daniela; Keleher, Jason, Parker, John. (Cabot Microelectronics Corporation, USA). US 7,955,520 – B2, 2011
4. Copper-passivating CMP compositions and methods for polishing copper. White, Daniela; Keleher, Jason; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2009), 18pp. CODEN: PIXXD2 WO 2009070239
5. Copper-passivating CMP compositions and methods for polishing copper. White, Daniela; Keleher, Jason; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 9 pp. CODEN: USXXCO US 2009134122
6. Slurries for polishing oxide and nitride with high removal rates. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 7pp. CODEN: USXXCO US 2009090696
7. Polishing composition and method utilizing abrasive particles treated with an aminosilane. Dysard, Jeffrey; Anjur, Sriram; Grumbine, Steven; White, Daniela; Ward, William. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 11pp. CODEN: USXXCO US 2009081871
8. Low pH barrier slurry based on titanium dioxide. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2009), 24pp.; Chemical Indexing Equivalent to 150:331679 (US). CODEN: PIXXD2 WO 2009038690
9. Low pH barrier slurry based on titanium dioxide. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), US 2009075566
10. Copper CMP composition containing ionic polyelectrolyte and method. White, Daniela; Keleher, Jason; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2009), 27pp. CODEN: PIXXD2 WO 2009032065
11. Copper CMP composition containing ionic polyelectrolyte and method. White, Daniela; Keleher, Jason J.; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 12 pp. CODEN: USXXCO US 2009056231
12. Ruthenium chemical-mechanical polishing (CMP) compositions and methods. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 11 pp., US 2009035942
13. Ruthenium chemical-mechanical polishing (CMP) compositions and methods. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2009), 23pp.; WO 2009017782
14. CMP compositions containing a soluble peroxometalate complex and methods of use thereof. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2008), 20pp.; WO 2008137053
15. CMP compositions containing a soluble peroxometalate complex and methods of use thereof. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2008), 9 pp US 2008274619 A1 20081106 Patent written in English. Application: US 2007-800188
16. Polyoxometalate compositions as abrasive for CMP of W-containing substrates. White, Daniela; Parker, John. (Cabot Microelectronics Corp., USA). U.S. Pat. Appl. Publ. (2008), 9 pp. CODEN: USXXCO US 2008060277
17. CMP compositions containing a soluble peroxometalate complex and methods of use thereof. White, Daniela; Parker, John, PCT Int. Appl. (2008), 20pp. WO 2008137053
18. Coating composition having improved mar and scratch properties. Retsch, William H.; Schneider, John R.; White, Daniela. (PPG Industries Ohio, Inc., USA). U.S. Pat. Appl. Publ. (2004), 11 pp. US 2004209088.
19. Polymerizable particles having ethylenically unsaturated groups on the surface for manufacture of coating additives. White, Daniela; Eisaman, Heather L.; Schneider, John R. (USA). U.S. Pat. Appl. Publ. (2004), 13 pp. US 2004191498.
20. Coating compositions with modified particles and use on substrates. Schneider, John R.; White, Daniela; Chasser, Anthony M.; O'Dwyer, James B.; Hockswender, Thomas R. (USA). U.S. Pat. Appl. Publ. (2003), 14 pp. US 2003229157.
21. Coating compositions with modified particles and methods of using the same. White, Daniela; O'Dwyer, James B.; Mayo, Michael A.; Poindexter, Laura E.; Schneider, John R.; White, Michael L.; Sadvary, Richard J.; Tyebjee, Shiryn; Carney, Joseph M.; Anderson, Lawrence G.; Simpson, Dennis A.; Hockswender, Thomas R. (PPG Industries Ohio, Inc., USA). U.S. Pat. Appl. Publ. (2003), 14 pp US 2003224174.
22. Synthesis of vinyl polymers by controlled radical polymerization. White, Daniela; O'Dwyer, James B. (PPG Industries Ohio, Inc., USA). PCT Int. Appl. (2002), 79 pp. WO 2002085957.
23. Pigment dispersions containing dispersants prepared by controlled radical polymerization having hydrophilic and hydrophobic segments. White, Daniela; Coca, Simion; O'Dwyer, James B. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2001), 40 pp, WO 2001044389.
24. Radiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systems. Schaedeli, Ulrich; Blakeney, Andrew J.; Steinhausler, Thomas; White, Daniela; Gabor, Allen H. (Arch Specialty Chemicals, Inc., USA). U.S. (2000), 7 pp, US 6146793.
25. Thermosetting compositions containing carboxylic acid functional polymers prepared by atom transfer radical polymerization. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'dwyer, James B.; Olson, Kurt G.; White, Daniela. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 60 pp. WO 2000013628.
26. Thermosetting compositions containing carboxylic acid functional polymers prepared by atom transfer radical polymerization. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'dwyer, James B.; Olson, Kurt G.; White, Daniela. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 60 pp. WO 2000012625.
27. Thermosetting compositions containing carboxylic acid functional polymers and epoxy functional polymers prepared by atom transfer radical polymerization. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'dwyer, James B.; Olson, Kurt G.; White, Daniela. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 72 pp. WO 2000012583.
28. Thermosetting compositions containing epoxy-functional polymers prepared by atom-transfer radical polymerization and coatings therefrom. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'Dwyer, James B.; Olson, Kurt G.; White, Daniela. (PPG Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 63 pp. WO 2000012581.
29. Thermosetting compositions containing hydroxy-functional polymers prepared by atom-transfer radical polymerization and powder coatings therefrom. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'dwyer, James B.; Olson, Kurt G.; White, Daniela. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 62 pp. WO 2000012579.
30. Thermosetting compositions containing hydroxyl-functional polymers prepared by atom-transfer radical polymerization and coatings therefrom. White, Daniela; O'Dwyer, James B.; Simpson, Dennis A. (PPG Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 56 pp. WO 2000012567.
31. Thermosetting compositions containing carbamate-functional polymers prepared by atom-transfer radical polymerization and coatings therefrom. Anderson, Lawrence G.; O'Dwyer, James B.; Simpson, Dennis A.; White, Daniela. (PPG Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 59 pp. WO 2000012566.
32. Photosensitive terpolymer for 193-nm photoresist composition. Schaedeli, Ulrich; Blakeney, Andrew J.; Steinhausler, Thomas; White, Daniela; Gabor, Allen H. (Olin Microelectronic Chemicals, Inc., USA). PCT Int. Appl. (1999), 29 pp. WO 9942903.
33. Preparation of acrylic homopolymers and block copolymers. Mardare, Daniela; Coca, Simion; Dimonie, Mihai. (Institutul de Cercetari Chimice - ICECHIM, Bucuresti, Rom.). Rom. (1997), 5 pp. RO 111771.
34. Process and catalysts for manufacture of acrylic-epoxy block-copolymers. Mardare, Daniela; Coca, Simion; Dimonie, Mihai. (Institutul de Cercetari Chimice - ICECHIM, Bucuresti, Rom.). Rom. (1997), 4 pp. RO 111776.
35. Preparation of block copolymers with acrylic and vinylpyridine sequences. Mardare, Daniela; Coca, Simion; Dimonie, Mihai. (Institutul de Cercetari Chimice, Bucuresti, Rom.). Rom. (1997), 3 pp. RO 111770.
36. Free-radical polymerization process. Mardare, Daniela; Matyjaszewski, Krzysztof A. (Carnegie Mellon University, USA). U.S. (1994), 5 pp. US 5312871.
1. Polyoxometallate compositions and methods. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). US 8,057,561 – B2, 2011
2. Ruthenium CMP composition and methods. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). US 8,008,202 – B2, 2011
3. Copper-passivating CMP composition and methods. White, Daniela; Keleher, Jason, Parker, John. (Cabot Microelectronics Corporation, USA). US 7,955,520 – B2, 2011
4. Copper-passivating CMP compositions and methods for polishing copper. White, Daniela; Keleher, Jason; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2009), 18pp. CODEN: PIXXD2 WO 2009070239
5. Copper-passivating CMP compositions and methods for polishing copper. White, Daniela; Keleher, Jason; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 9 pp. CODEN: USXXCO US 2009134122
6. Slurries for polishing oxide and nitride with high removal rates. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 7pp. CODEN: USXXCO US 2009090696
7. Polishing composition and method utilizing abrasive particles treated with an aminosilane. Dysard, Jeffrey; Anjur, Sriram; Grumbine, Steven; White, Daniela; Ward, William. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 11pp. CODEN: USXXCO US 2009081871
8. Low pH barrier slurry based on titanium dioxide. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2009), 24pp.; Chemical Indexing Equivalent to 150:331679 (US). CODEN: PIXXD2 WO 2009038690
9. Low pH barrier slurry based on titanium dioxide. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), US 2009075566
10. Copper CMP composition containing ionic polyelectrolyte and method. White, Daniela; Keleher, Jason; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2009), 27pp. CODEN: PIXXD2 WO 2009032065
11. Copper CMP composition containing ionic polyelectrolyte and method. White, Daniela; Keleher, Jason J.; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 12 pp. CODEN: USXXCO US 2009056231
12. Ruthenium chemical-mechanical polishing (CMP) compositions and methods. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2009), 11 pp., US 2009035942
13. Ruthenium chemical-mechanical polishing (CMP) compositions and methods. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2009), 23pp.; WO 2009017782
14. CMP compositions containing a soluble peroxometalate complex and methods of use thereof. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). PCT Int. Appl. (2008), 20pp.; WO 2008137053
15. CMP compositions containing a soluble peroxometalate complex and methods of use thereof. White, Daniela; Parker, John. (Cabot Microelectronics Corporation, USA). U.S. Pat. Appl. Publ. (2008), 9 pp US 2008274619 A1 20081106 Patent written in English. Application: US 2007-800188
16. Polyoxometalate compositions as abrasive for CMP of W-containing substrates. White, Daniela; Parker, John. (Cabot Microelectronics Corp., USA). U.S. Pat. Appl. Publ. (2008), 9 pp. CODEN: USXXCO US 2008060277
17. CMP compositions containing a soluble peroxometalate complex and methods of use thereof. White, Daniela; Parker, John, PCT Int. Appl. (2008), 20pp. WO 2008137053
18. Coating composition having improved mar and scratch properties. Retsch, William H.; Schneider, John R.; White, Daniela. (PPG Industries Ohio, Inc., USA). U.S. Pat. Appl. Publ. (2004), 11 pp. US 2004209088.
19. Polymerizable particles having ethylenically unsaturated groups on the surface for manufacture of coating additives. White, Daniela; Eisaman, Heather L.; Schneider, John R. (USA). U.S. Pat. Appl. Publ. (2004), 13 pp. US 2004191498.
20. Coating compositions with modified particles and use on substrates. Schneider, John R.; White, Daniela; Chasser, Anthony M.; O'Dwyer, James B.; Hockswender, Thomas R. (USA). U.S. Pat. Appl. Publ. (2003), 14 pp. US 2003229157.
21. Coating compositions with modified particles and methods of using the same. White, Daniela; O'Dwyer, James B.; Mayo, Michael A.; Poindexter, Laura E.; Schneider, John R.; White, Michael L.; Sadvary, Richard J.; Tyebjee, Shiryn; Carney, Joseph M.; Anderson, Lawrence G.; Simpson, Dennis A.; Hockswender, Thomas R. (PPG Industries Ohio, Inc., USA). U.S. Pat. Appl. Publ. (2003), 14 pp US 2003224174.
22. Synthesis of vinyl polymers by controlled radical polymerization. White, Daniela; O'Dwyer, James B. (PPG Industries Ohio, Inc., USA). PCT Int. Appl. (2002), 79 pp. WO 2002085957.
23. Pigment dispersions containing dispersants prepared by controlled radical polymerization having hydrophilic and hydrophobic segments. White, Daniela; Coca, Simion; O'Dwyer, James B. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2001), 40 pp, WO 2001044389.
24. Radiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systems. Schaedeli, Ulrich; Blakeney, Andrew J.; Steinhausler, Thomas; White, Daniela; Gabor, Allen H. (Arch Specialty Chemicals, Inc., USA). U.S. (2000), 7 pp, US 6146793.
25. Thermosetting compositions containing carboxylic acid functional polymers prepared by atom transfer radical polymerization. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'dwyer, James B.; Olson, Kurt G.; White, Daniela. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 60 pp. WO 2000013628.
26. Thermosetting compositions containing carboxylic acid functional polymers prepared by atom transfer radical polymerization. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'dwyer, James B.; Olson, Kurt G.; White, Daniela. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 60 pp. WO 2000012625.
27. Thermosetting compositions containing carboxylic acid functional polymers and epoxy functional polymers prepared by atom transfer radical polymerization. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'dwyer, James B.; Olson, Kurt G.; White, Daniela. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 72 pp. WO 2000012583.
28. Thermosetting compositions containing epoxy-functional polymers prepared by atom-transfer radical polymerization and coatings therefrom. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'Dwyer, James B.; Olson, Kurt G.; White, Daniela. (PPG Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 63 pp. WO 2000012581.
29. Thermosetting compositions containing hydroxy-functional polymers prepared by atom-transfer radical polymerization and powder coatings therefrom. Barkac, Karen A.; Coca, Simion; Franks, James R.; Humbert, Kurt A.; Lamers, Paul H.; Martin, Roxalana L.; O'dwyer, James B.; Olson, Kurt G.; White, Daniela. (Ppg Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 62 pp. WO 2000012579.
30. Thermosetting compositions containing hydroxyl-functional polymers prepared by atom-transfer radical polymerization and coatings therefrom. White, Daniela; O'Dwyer, James B.; Simpson, Dennis A. (PPG Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 56 pp. WO 2000012567.
31. Thermosetting compositions containing carbamate-functional polymers prepared by atom-transfer radical polymerization and coatings therefrom. Anderson, Lawrence G.; O'Dwyer, James B.; Simpson, Dennis A.; White, Daniela. (PPG Industries Ohio, Inc., USA). PCT Int. Appl. (2000), 59 pp. WO 2000012566.
32. Photosensitive terpolymer for 193-nm photoresist composition. Schaedeli, Ulrich; Blakeney, Andrew J.; Steinhausler, Thomas; White, Daniela; Gabor, Allen H. (Olin Microelectronic Chemicals, Inc., USA). PCT Int. Appl. (1999), 29 pp. WO 9942903.
33. Preparation of acrylic homopolymers and block copolymers. Mardare, Daniela; Coca, Simion; Dimonie, Mihai. (Institutul de Cercetari Chimice - ICECHIM, Bucuresti, Rom.). Rom. (1997), 5 pp. RO 111771.
34. Process and catalysts for manufacture of acrylic-epoxy block-copolymers. Mardare, Daniela; Coca, Simion; Dimonie, Mihai. (Institutul de Cercetari Chimice - ICECHIM, Bucuresti, Rom.). Rom. (1997), 4 pp. RO 111776.
35. Preparation of block copolymers with acrylic and vinylpyridine sequences. Mardare, Daniela; Coca, Simion; Dimonie, Mihai. (Institutul de Cercetari Chimice, Bucuresti, Rom.). Rom. (1997), 3 pp. RO 111770.
36. Free-radical polymerization process. Mardare, Daniela; Matyjaszewski, Krzysztof A. (Carnegie Mellon University, USA). U.S. (1994), 5 pp. US 5312871.