Vladimir Samara star Proven Solver

- Design of an improvement to a planar Langmuir probe for measuring the ion flux and deposited film characterization during plasma etching (patent pending US 2012/0283973 A1)

- Method and apparatus for real-time monitoring of plasma etch uniformity by OES interference (patent pending EP14199680.1)

- Design of a new technique for the electron density measurements using a modified hairpin probe