Environmental Barrier for a Refractory Substrate Containing Silicon

The invention relates to a method for protecting a substrate (10), in which at least one portion adjacent to a surface is made of a refractory material containing silicon, during high-temperature use in an oxidising, humid environment, which consists of forming a boron-free environmental barrier on the surface of the substrate, having at least one layer (22) essentially made of a system of oxides formed by at least one oxide of a rare earth element, silica and alumina and which is capable of self-healing with the sustained presence of at least one solid phase in a temperature range of up to at least around 1400 DEG C.

Attached files:


Patents:
WO 2,010,072,978

Inventor(s): COURCOT EMILIE [FR]; REBILLAT FRANCIS [FR]; LOUCHET-POUILLERIE CAROLINE [FR]; TAWIL HENRI [FR]

Type of Offer: Sale



« More Engineering - Industrial Patents

---