Method for Forming Mems Variable Capacitors

A method for fabricating an out-of-plane variable overlap MEMS capacitor comprises: providing a substrate (40) comprising a first layer (41), a second layer (42), and a third layer (43) stacked on top of one another; and etching a plurality of first trenches (70) through the third layer (43), through the second layer (42), and into the first layer (41) using a single etching mask. Etching the plurality of first trenches (70) defines a plurality of first fingers (51) in the third layer (43) and a plurality of second fingers (52) in the first layer (41). By using a single mask, the process is self-aligned. The method further comprises removing the second layer (42) in a first region where the plurality of first trenches (70) are provided, thereby forming a spacing or gap between the plurality of first fingers (51) and the plurality of second fingers (52).

Attached files:
WO 2011003803.jpg

Patents:
WO 2,011,003,803

Inventor(s): STERKEN TOM [BE]; ALTENA GEERT [NL]; GOEDBLOED MARTIJN [DE]; PUERS ROBERT [BE]

Type of Offer: Sale



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