Improved cleaning of plasma chamber walls by adding of noble gas cleaning step

An improved reaction chamber and chamber cleaning process are disclosed able to remove water residues by making use of noble-gas plasma reactions. The chamber is easy to operate and the method is easily applicable and may be combined with standard cleaning procedure. A noble-gas plasma (e.g. He) that emits high energy EUV photons (E>20 eV) which is able to destruct water molecules forming electronically excited oxygen atoms is used to remove the adsorbed water.

Attached files:


Patents:
EP 2,034,046

Inventor(s): URBANOWICZ ADAM MICHAL [PL]; BAKLANOV MIKHAIL [BE]; SHAMIRYAN DENIS [BE]; DE GENDT STEFAN [BE]

Type of Offer: Sale



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