Patterned Nanosubstrates Made By Directed Self Assembly of Amphiphilic Molecules

Nanoscale patterns prepared by lithography are used to direct the self-assembly of amphiphilic molecules to form patterned nanosubstrates having a desired distribution of chemical functional moieties. These patterns can be fabricated over a large area and require no special limitations on the chemistry the assembled amphiphiles. Hydrophilic/hydrophobic patterns can be created and used to direct the deposition of a single functional component to specific regions of the surface or to selectively assemble polymer blends to desired sites in a one step fashion with high specificity and selectivity. The selective deposition of functional moieties on a patterned surface can be based on electrostatic forces, hydrogen bonding, or hydrophobic interactions.; The methods and patterned nanosubstrates of the invention can be used in the assembly of functional polymer systems, polyelectrolytes, biomolecules, conducting polymers, colloids and nanoparticles, and find wide technological applications in biosensors, biochips, photonics and electronics.

Attached files:
2009075720.jpg

Patents:
WO 2,009,075,720

Inventor(s): BUSNAINA AHMED [US]; MEAD JOEY L [US]; BARRY CAROL M F [US]; WEI MING [US]

Type of Offer: Licensing



Next Patent »
« More Nanotech Patents

Share on      


CrowdSell Your Patent