Ultrafast Microscopy of Surface Electromagnetic Fields

System(s) and method(s) to probe electromagnetic fields at the surface of a solid-state material are provided. The technique combines ultrafast (e.g., less than 10 fs) optical excitation and electron microscopy to generate electronic excitations and image the ensuing electromagnetic fields with nanometer-scale spatial resolution and femtosecond time-scale resolution. In addition, time-of-flight energy analysis facilitates imaging of relaxation a generated electronic excitation. The dynamics of the electromagnetic fields can be probed interferometrically through generation of multi-frame imaging, with inter-frame frequency of the order of a few hundreds of attoseconds, of interference patterns among an electric field associated with an excitation in a sample or device and the electromagnetic field of a probe pulse coherent with an excitation pulse. Quality assurance of nanoscopic devices based on plasmonic, photonic, electronic, spintronic operation can be analyzed with spectroscopy provided in the subject innovation.

Attached files:


Patents:
US 20,090,066,963

Inventor(s): PETEK HRVOJE [US]; KUBO ATSUSHI [JP]; PONTIUS NIKOLAUS JOHANNES [DE]

Type of Offer: Licensing



« More Microscopy Patents

---