Titanium Dioxide Thin Film Systems and Method of Making Same

A method for producing a thin film titanium dioxide is disclosed. The disclosed method for producing the thin film titanium dioxide includes performing a magnetron reactive sputtering process to vaporize at least portions of a titanium source in a sputtering chamber that is supplied with gaseous oxygen. The vaporized titanium reacts with the oxygen to form anatase titanium dioxide, which is deposited on a substrate within the sputtering chamber.

Attached files:
US 20100043881.jpg

Patents:
US 20,100,043,881

Inventor(s): IBRAHIM ALHOMOUDI IBRAHIM ABDULLAH [US]; NEWAZ GOLAM [US]; AUNER GREGORY W [US]

Type of Offer: Licensing

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