Thermally Stable Volatile Film Precursors
A precursor for the deposition of a thin film by atomic layer deposition is provided. The compound has the formula MxLy where M is a metal and L is an amidrazone-derived ligand or an amidate-derived ligand. A process of forming a thin film using the precursors is also provided.
WINTER CHARLES H [US]; KNISLEY THOMAS JOSEPH [US]; KARUNARATHNE PANDITHA KORALALAGE DON MAHESH CHINTH [US]
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