Systems and Methods for Forming Defects on Graphitic Materials and Curing Radiation-Damaged Graphitic Materials

Systems and methods are disclosed herein for forming defects on graphitic materials. The methods for forming defects include applying a radiation reactive material on a graphitic material, irradiating the applied radiation reactive material to produce a reactive species, and permitting the reactive species to react with the graphitic material to form defects. Additionally, disclosed are methods for removing defects on graphitic materials.

Patents:
US 20,110,062,422

Inventor(s): RYU SUNMIN [KR]; BRUS LOUIS E [US]; STEIGERWALD MICHAEL L [US]; LIU HAITAO [US]

Type of Offer: Licensing



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