Methods for Graphene-assisted Fabrication of Micro- and Nanoscale Structures and Devices Featuring the Same

Methods for graphene-assisted fabrication of a surface on a substrate are disclosed herein. In an exemplary method, fabricating an etched surface on a substrate includes, depositing at least one layer of graphene on the surface on the substrate, patterning the deposited layer of graphene, and exposing the surface on a substrate to an acid to etch the surface on the substrate. The method can further include forming the layer of graphene from graphite. In some embodiments, the layer of graphene is formed by mechanically exfoliating the layer of graphene from the graphite. Alternatively, the layer of graphene can be formed by chemically exfoliating the graphene from the graphite, or other carbon materials, and/or utilizing vapor deposition to form the layer of graphene from the graphite, or other carbon materials.

Attached files:


Patents:
WO 2,010,065,518

Inventor(s): BOLOTIN KIRILL [US]; KLIMA MARTIN [DE]; STORMER HORST [US]; KIM PHILIP [US]; HONE JAMES [US]

Type of Offer: Licensing



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