Software-controlled Maskless Optical Lithography Using Fluorescence Feedback

A software-controlled maskless optical lithography system uses fluorescence feedback to control an aspect of the lithography, such as light source dose, wavelength, or flashing instances or duration, spatial light modulator (SLM) pattern, an optics parameter, a beamsplitter control parameter, or movement or positioning of a stage carrying a target workpiece, such as a semiconductor wafer.

Attached files:


Patents:
US 7,955,766

Inventor(s): KYMISSIS IOANNIS [US]

Type of Offer: Licensing



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