Horizontally Depleted Metal Semiconductor Field Effect Transistor

The present invention provides a horizontally depleted Metal Semiconductor Field Effect Transistor (MESFET). A drain region, a source region, and a channel region are formed in the device layer such that the drain region and the source region are spaced apart from one another and the channel region extends between the drain region and the source region. First and second gate contacts are formed in the device layer on either side of the channel region, and as such, the first and second gate contacts will also reside between opposing portions of the source and drain regions. With this configuration, voltages applied to the first and second gate contacts effectively control vertical depletion regions, which form on either side of the channel region.

Attached files:


Patents:
WO 2,009,036,273

Inventor(s): ERVIN JOSEPH E [US]; THORNTON TREVOR JOHN [US]

Type of Offer: Licensing



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