Block Copolymer-assisted Nanolithography

In accordance with an embodiment of the disclosure, a method for forming submicron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1 [mu]m.

Patents:
US 20,110,165,341

Inventor(s): MIRKIN CHAD A [US]; CHAI JINAN [US]; HUO FENGWEI [CN]; ZHENG ZIJIAN [CN]; GIAM LOUISE R [US]

Type of Offer: Licensing



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