Plasma-deposited Electrically Insulating, Diffusion-resistant and Elastic Layer System

A multilayer system on a substrate, the multilayer system being applied to the substrate by plasma deposition, characterized in that the multilayer system is configured such that it has substantial diffusion resistance to ions in an aqueous solution, wherein the current produced by the diffusion of the ions with the connection of an electric field gradient of more than 10<4>V/m, preferably more than 10<5>V/m, most preferred more than 10<7>V/m is IIon < 6,5X10<-8> A/cm<2>, preferably IIon < 6,5X10 <-10> A/cm<2>, particularly IIon < 1X10<-12> A/cm<2>.

Attached files:


Patents:
EP 2,137,337

Inventor(s): BUSCH HEINZ WERNER [DE]; GRABOWY UDO HEINRICH [DE]; KLEINEN LISA [DE]

Type of Offer: Sale



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