Clathrate Compounds and Methods of Manufacturing

The present invention comprises new materials, material structures, and processes of fabrication of such that may be used in technologies involving the conversion of light to electricity and/or heat to electricity, and in optoelectronics technologies. The present invention provide for the fabrication of a clathrate compound comprising a type II clathrate lattice with atoms of silicon and germanium as a main framework forming lattice spacings within the framework, wherein the clathrate lattice follows the general formula Si136-yGey, where y indicates the number of Ge atoms present in the main framework and 136-y indicates the number of Si atoms present in the main framework, and wherein y>0.

Attached files:


Patents:
US 8,211,400 issued 2012-07-03   [MORE INFO]
US 7,534,414 issued 2009-05-19   [MORE INFO]

Inventor(s): NOLAS GEORGE S [US]; WITANACHCHI SARATH [US]; MUKHERJEE PRITISH [US]

Type of Offer: Licensing



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