Deposition of Device Quality, Low Hydrogen Content, Amorphous Silicon Films by Hot Filament Technique Using (SAFE) Silicon Source Gas

A method of producing hydrogenated amorphous silicon on a substrate by flowing a stream of safe (diluted to less than 1%) silane gas past a heated filament.

US 5,776,819   [MORE INFO]

Inventor(s): Archie H. Mahan; Brent P. Nelson; Edith C. Molenbroek

Type of Offer: Licensing

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