Direct Forming of Microoptics Using a Dynamic Photomask

Background Microoptics are key to information processing, optoelectronics, and integrated optics. Existing fabrication methods involve expensive lithographic masks, complicated molding, and reactive ion etching. These methods lack the flexibility in geometry and are often limited to low-profile microoptics, which typically do not possess high numerical aperture required by many applications.

Invention Description The technology is an innovative method to design and fabricate microoptics using dynamic photomasks. It provides: 1) a significant degree of freedom in the geometry of the optics; 2) changing geometries can be done on the fly, without requiring to make or to switch photomasks; 3) little or no tool contamination and wear compared to a typical replication process; and 4) low cost, fast turnaround, and flexible design


Benefits

Fast processing Free-form fabrication Design flexibility Scalable Low costs

Features

This innovation represents a strategy for manufacturing precision microoptics. The use of a dynamic photomasks offers fast turn-around and enables changing geometries "on the fly". This method accommodates complex and high profile geometries.

Market Potential/Applications Microoptics arrays

Development Stage Lab/bench prototype

IP Status One U.S. patent application filed

UT Researcher Shaochen Chen, Ph.D., Mechanical Engineering, The University of Texas at Austin Yi Lu, Ph.D., The University of Texas at Austin

Type of Offer: Licensing



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