Method for Improving the Stability of Amorphous Silicon
U.S. Patent 6,713,400Technology Description A method of producing a metastable degradation resistant amorphous hydrogenated silicon film is provided, which comprises the steps of growing a hydrogenated amorphous silicon film, the film having an exposed surface, illuminating the surface using an essentially blue or ultraviolet light to form high densities of a light induced defect near the surface, and etching the surface to remove the defect.
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Type of Offer: Licensing
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