Selective Buried Etch Stop (SES) Silicon Device Fabrication Process ()

Abstract:
A NASA Goddard Space Flight Center (GSFC) development team has achieved breakthroughs in bulk silicon micromachining of microelectromechanical (MEMS)-based submillimeter and far infrared (IR) radiation detectors. The IR detectors are ultra-thin, three-dimensional (3D) structures made possible by the SES process and represent novel, high-performance, one-of-a-kind MEMS devices.

Type of Offer: Licensing



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