Projection exposure system for manufacturing semiconductor component

The system has an optical assembly held within a housing (2) by a bearing unit (4), and a changing unit for changing the optical assembly, where the optical assembly is exchangeably formed. The bearing unit reduces deformations of an optical element caused by a holder. The optical assembly has a support (1) for the optical element, where the bearing unit is formed as a part of the support. The bearing unit has a rotatable and formfit ball (41) supported in a recess of the support, where the ball is pressed against a support element (5) connected with the housing by a clamping device.

Attached files:
projection-exposure.jpg

Patents:
DE 102,008,044,365

Inventor(s): SCHOEPPACH ARMIN [DE]; HEMBACHER STEFAN [DE]; LIMBACH GUIDO [DE]; PETASCH THOMAS [DE]; KWAN YIM-BUN-PATRICK [DE]; KULITSKY VIKTO

Type of Offer: Sale



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