Generation of Photomasks By Dip-pen Nanolithography
A method of forming a photomask using a microtip is disclosed herein. The method can include depositing a sacrificial pattern on a substrate using a microtip, forming a mask layer over the sacrificial pattern, and removing the sacrificial pattern and a portion of the mask layer disposed on the sacrificial pattern to form a photomask.
MIRKIN CHAD A [US]; JANG JAE-WON [US]; SANEDRIN RAYMOND G [US]; SENESI ANDREW J [US]; ZHENG ZIJIAN [US]
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