Nanoscale, Spatially-controlled Ga Doping of Undoped Transparent Conducting Oxide Films
An article of manufacture comprising a nanowire and methods of making the same. In one embodiment, the nanowire includes a Ga-doped trace formed on a surface of an indium oxide layer having a thickness in nano-scale, and wherein the Ga-doped trace is formed with a dimension that has a depth is less than a quarter of the thickness of the indium oxide layer. In one embodiment, the indium oxide layer, which is optically transparent and electrically insulating, comprises an In2O3 film, and the thickness of the indium oxide layer is about 40 nm, and the depth of the nanowire is less than 10 nm.
US 20,100,230,814 [MORE INFO
MARKS TOBIN J [US]; HERSAM MARK C [US]; CORTES NORMA E S [US]
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