Method of Imaging with Light Wavelength 157nm

Description In semiconductor manufacturing, major process steps are involved increasing the opportunity for defects. According to industry experts, the semiconductor industry looses an estimated $200 million each year due to photomask damage. This problem is made worse every time the design rules are shrunk. As a result, inspection and measurement have become a critical area in semiconductor manufacturing. Researchers at the University of Hawaii have developed a way of detecting defects in materials that involve less steps, saves time and money.

The invention is a method of forming and storing the image of an object on a thin KCl(potassium chloride) film with light of wavelength 157nm. The stored image can be reproduced with visible light and a photoelectron microscope. The quality of the photomasks can be checked without using photoresist and the method is not destructive. The photomask is exposed only to light of wavelength 157nm and not to energetic electrons as required by a conventional electron microscope.

Applications Detecting defects in photomasks for 157 nm lithography. To detect protein particles in bio-membranes. Main Advantages Can be used to inspect photomasks for defects before they are copied to semiconductors. The photomask is exposed only to light of wavelength 157 nm (which is not destructive) and not to energetic electrons as required by a conventional electron microscope. Cost savings for having less defects on production lines. Saves time because there is no photoresist to develop. Having the ability to image protein particles in bio-membranes will enhance medical research abilities.

Type of Offer: Licensing



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