Actuator and Projection Exposure System

The actuator (1) according to the invention comprises a housing (2) and a rotor (3) that can be moved in relation to the housing (2) in the effective direction of the actuator, wherein the actuator (1) comprises an advancing unit that is connected to the rotor (3) at least part of the time. The advancing unit comprises at least one deformation unit (6) and at least one deformer (5) for deforming the deformation unit (6). The at least one deformer (5) is suited to deform the deformation unit (6) perpendicular to the effective direction of the actuator (1) such that the total length of the deformation unit (6) changes in the effective direction as a result of the deformation.; The invention further relates to a projection exposure system (310) for semiconductor lithography comprising an actuator (1) according to the invention, and to a method for operating an actuator (1) according to the invention.

Attached files:


Patents:
DE 102,008,034,285

Inventor(s): WEBER ULRICH [DE]; HEMBACHER STEFAN [DE]; SCHOEPPACH ARMIN [DE]

Type of Offer: Sale



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