Method of Surface Treating Microfluidic Devices
The formation of a barrier layer within individual channels or cavities of a microfluidic device is described. The barrier layer is effected through a gas phase deposition process, desirably implemented in a plasma environment.
GANDHIRAMAN RAM PRASAD [IN]; BASABE-DESMONTS LOURDES [ES]; RIAZ ASIF [PK]; LEE LUKE [US]; DIMOV IVAN [CL]; DUCREE JENS [IE]; DAN
Type of Offer:
« More Chemistry Patents