Method of Surface Treating Microfluidic Devices

The formation of a barrier layer within individual channels or cavities of a microfluidic device is described. The barrier layer is effected through a gas phase deposition process, desirably implemented in a plasma environment.

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Patents:
WO 2,010,146,153

Inventor(s): GANDHIRAMAN RAM PRASAD [IN]; BASABE-DESMONTS LOURDES [ES]; RIAZ ASIF [PK]; LEE LUKE [US]; DIMOV IVAN [CL]; DUCREE JENS [IE]; DAN

Type of Offer: Sale



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