One-step Method for Applying a Metal Layer Onto a Substrate

The invention relates to a one-step method for applying at least one metal layer onto a substrate by means of a gas phase deposition method. A substrate is coated with a metal layer in that a metal from a metal-containing precursor compound is precipitated from a gas phase onto the substrate, the metal-containing precursor compound is dissolved in a solvent, an organic reactant is added, and the metal-containing precursor compound and the organic reactant are converted into the gas phase, the metal of the metal-containing precursor compound is released by means of the organic reactant and the released metal is deposited onto the substrate.

Attached files:


Patents:
WO 2,008,006,785

Inventor(s): KOHSE-HOEINGHAUS KATHARINA [DE]; BAHLAWANE NAOUFAL [DE]; PREMKUMAR ANTONY [DE]

Type of Offer: Sale



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