Patterning

The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film of said electronic or photonic material on said substrate; and using a fluoropolymer to protect regions of said electronic or photonic material during a patterning process.

Attached files:
WO 2011004198.jpg

Patents:
WO 2,011,004,198

Inventor(s): SIRRINGHAUS HENNING [GB]; CHANG JUI-FEN [GB]; GWINNER MICHAEL [GB]

Type of Offer: Sale

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