Optical Imaging Device

An optical imaging device for microlithography is provided to reduce the coat for correction of the optical imaging error and to decrease the effect of dynamic variation of the pressure difference between the first atmosphere and the second atmosphere. An optical imaging device comprises at least one optical unit(109); and at least one maintenance device(104) related with the optical unit, wherein the maintenance device maintains the optical unit, the first part(109.1) of the optical unit is in contact with the first atmosphere, the second part(109.2) of the optical unit is at least temporarily in contact with the second atmosphere, and the optical imaging device comprises further a reducing device(115) to reduce the dynamic variation of the pressure difference between the first atmosphere and the second atmosphere.

Attached files:


Patents:
KR 20,070,112,079   [MORE INFO]

Inventor(s): HEMBACHER STEFAN [DE]; GELLRICH BERNHARD [DE]; KUGLER JENS [DE]

Type of Offer: Sale



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