Method for Manufacturing Solar Cell
A method for manufacturing a solar cell having a single crystal silicon substrate and an amorphous silicon layer provided at least on one side surface of the single crystal silicon substrate is provided. The method includes the steps of: (a) forming an intrinsic amorphous silicon layer by coating a first liquid containing silicon atoms on one surface of the single crystal silicon substrate, and sintering the first liquid coated; and (b) forming an impure amorphous silicon layer on the intrinsic amorphous silicon layer.
The present invention relates to solar cells, and more particularly to thin photovoltaic conversion layers of heterojunction solar cells.
A HIT (Heterojunction with Intrinsic Thin-layer) solar cell is formed from a crystalline silicon substrate and a laminate of an amorphous silicon layer and a transparent conductive layer formed on one or each of two surfaces of the substrate. HIT solar cells may be characterized in that they can be manufactured by a manufacturing process in a lower temperature state, compared to crystalline silicon solar cells, and can achieve a lower manufacturing cost. For example, Japanese Laid-open Patent Application JA-P-2003-282905 (Patent Document 1) is an example of related art.
AJIKI YOSHIHARU [JP]; TANAKA HIDEKI [JP]
Type of Offer:
« More Energy Patents« More Solar Patents