Methods and apparatus for producing a CMOS image sensor result in a plurality of photo sensitive layers (A,B,C ); each layer including: a glass or glass ceramic substrate (102A, 102B, 102C) having first (102A-1, 102B-1, 102C-19 and second (102A-2, 102B-2, 102C-2) spaced-apart surfaces; a semiconduct
...